Observation of nanometer silicon clusters in the hot-filament CVD process

Journal of Crystal Growth

Volumn 204, Issue 1, 1999, Pages 52-61

  Cheong, Woo S ^a   Hwang, Nong M ^b,c   Yoon, Duk Y ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Korea Research Institute of Standards and Science   (South Korea)

^c Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; MORPHOLOGY; NUCLEATION; PRECIPITATION (CHEMICAL); SILICON; SUPERSATURATION; TRANSMISSION ELECTRON MICROSCOPY;

GAS PHASE NUCLEATION;

CHEMICAL VAPOR DEPOSITION;

EID: 0032677281     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(99)00145-1     Document Type: Article

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