Nanocrystalline silicon superlattices: Fabrication and characterization

Journal of Non-Crystalline Solids

Volumn 227-230, Issue PART 2, 1998, Pages 1132-1136

  Zacharias, M ^a,b   Tsybeskov, L ^a   Hirschman, K D ^a   Fauchet, P M ^a   Blasing J ^b   Kohlert, P ^b   Veit, P ^b  

^a University of Rochester   (United States)

^b OTTO VON GUERICKE UNIVERSITY   (Germany)

Author keywords

Plasma oxidation; Radio frequency sputtering; Si crystals

Indexed keywords

AMORPHOUS SILICON; ANNEALING; BAND STRUCTURE; OXIDATION; PASSIVATION; PHOTOLUMINESCENCE; PLASMA APPLICATIONS; QUANTUM EFFICIENCY; SPUTTER DEPOSITION; SUPERLATTICES;

NANOCRYSTALLINE SILICON SUPERLATTICES; PLASMA OXIDATION; RADIO FREQUENCY SPUTTERING;

NANOSTRUCTURED MATERIALS;

EID: 0032065203     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(98)00287-7     Document Type: Article

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