SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 330, Issue 2, 1998, Pages 202-205

Preparation of SiO2 films with embedded Si nanocrystals by reactive r.f. magnetron sputtering

(6) Seifarth, H a Grotzschel R a Markwitz, A a Matz, W a Nitzsche, P a Rebohle, L a

a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH (Germany)

Author keywords

Nanostructures; Plasma processing; Silicon oxide; Sputtering

Indexed keywords

AMORPHOUS FILMS; ANNEALING; COMPOSITION EFFECTS; FILM PREPARATION; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; NUCLEATION; PHOTOLUMINESCENCE; PLASMA APPLICATIONS; SILICA; SILICON WAFERS; SPUTTER DEPOSITION;

NORMALIZED OPTICAL EMISSION INTENSITY;

SEMICONDUCTING FILMS;

EID: 0032157520 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(98)00609-9 Document Type: Article

Times cited : (69)

References (15)

1
- 35949006582
- Y. Kanemitsu, T. Ogawa, K. Shiraishi, K. Takeda, Phys. Rev. B 48 (1993) 4883.
- (1993) Phys. Rev. B , vol.48 , pp. 4883
- Kanemitsu, Y.¹ Ogawa, T.² Shiraishi, K.³ Takeda, K.⁴

2
- 0025839004
- M. Yamamoto, R. Hayashi, K. Tsunetomo, K. Kohno, Y. Osaka, Jpn. J. Appl. Phys. 30 (1991) 136.
- (1991) Jpn. J. Appl. Phys. , vol.30 , pp. 136
- Yamamoto, M.¹ Hayashi, R.² Tsunetomo, K.³ Kohno, K.⁴ Osaka, Y.⁵

3
- 0026836129
- Y. Osaka, K. Tsunetomo, F. Toyomura, H. Myoren, K. Kohno, Jpn. J. Appl. Phys. 31 (1992) L365.
- (1992) Jpn. J. Appl. Phys. , vol.31
- Osaka, Y.¹ Tsunetomo, K.² Toyomura, F.³ Myoren, H.⁴ Kohno, K.⁵

4
- 0027667651
- S. Hayashi, T. Nagareda, Y. Kanzawa, K. Yamamoto, Jpn. J. Appl. Phys. 32 (1993) 3840.
- (1993) Jpn. J. Appl. Phys. , vol.32 , pp. 3840
- Hayashi, S.¹ Nagareda, T.² Kanzawa, Y.³ Yamamoto, K.⁴

5
- 0001089512
- K. Kohno, Y. Osaka, F. Toyomura, H. Katayama, Jpn. J. Appl. Phys. 33 (1994) 6616.
- (1994) Jpn. J. Appl. Phys. , vol.33 , pp. 6616
- Kohno, K.¹ Osaka, Y.² Toyomura, F.³ Katayama, H.⁴

6
- 0029293422
- Q. Zhang, S.C. Bayliss, D.A. Hutt, Appl. Phys. Lett. 66 (1995) 1977.
- (1995) Appl. Phys. Lett. , vol.66 , pp. 1977
- Zhang, Q.¹ Bayliss, S.C.² Hutt, D.A.³

7
- 0030149021
- S. Yoshida, T. Hanada, S. Tanabe, N. Soga, Jpn. J. Appl. Phys. 35 (1996) 2694.
- (1996) Jpn. J. Appl. Phys. , vol.35 , pp. 2694
- Yoshida, S.¹ Hanada, T.² Tanabe, S.³ Soga, N.⁴

8
- 36549098647
- S. Berg, T. Larsson, C. Nender, H.-O. Blom, J. Appl. Phys. 63 (1988) 887.
- (1988) J. Appl. Phys. , vol.63 , pp. 887
- Berg, S.¹ Larsson, T.² Nender, C.³ Blom, H.-O.⁴

9
- 84956037093
- T. Larsson, H.-O. Blom, C. Nender, S. Berg, J. Vac. Sci. Technol. A 6 (1988) 1832.
- (1988) J. Vac. Sci. Technol. A , vol.6 , pp. 1832
- Larsson, T.¹ Blom, H.-O.² Nender, C.³ Berg, S.⁴

10
- 84957284944
- S. Berg, H.-O. Blom, M. Moradi, C. Nender, T. Larsson, J. Vac. Sci. Technol. A 7 (1989) 1225.
- (1989) J. Vac. Sci. Technol. A , vol.7 , pp. 1225
- Berg, S.¹ Blom, H.-O.² Moradi, M.³ Nender, C.⁴ Larsson, T.⁵

11
- 0024666251
- H. Seifarth, Thin Solid Films 172 (1989) 61.
- (1989) Thin Solid Films , vol.172 , pp. 61
- Seifarth, H.¹

12
- 0004135598
- Academic Press, New York
- H.G. Tompkins, A User's Guide to Ellipsometry, Academic Press, New York, 1993, pp. 246-248.
- (1993) A User's Guide to Ellipsometry , pp. 246-248
- Tompkins, H.G.¹

13
- 0003392447
- Wiley, New York
- H.P. Klug, L.E. Alexander, X-ray Diffraction Procedures, Wiley, New York. 1974. Pp. 656-687.
- (1974) X-ray Diffraction Procedures
- Klug, H.P.¹ Alexander, L.E.²

14
- 0001638611
- R. Tohmon, Y. Shimogaichi, H. Mizuno, Y. Ohki, Phys. Rev. Lett. 62 (1989) 1388.
- (1989) Phys. Rev. Lett. , vol.62 , pp. 1388
- Tohmon, R.¹ Shimogaichi, Y.² Mizuno, H.³ Ohki, Y.⁴

15
- 0027109561
- L. Skuja, J. Non. Cryst. Solids 149 (1992) 77.
- (1992) J. Non. Cryst. Solids , vol.149 , pp. 77
- Skuja, L.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.