Charging effects in silicon nanocrystals embedded in SiO2 films

Materials Science and Engineering: B

Volumn 101, Issue 1-3, 2003, Pages 270-274

  Kouvatsos, D N ^a   Ioannou Sougleridis, V ^a   Nassiopoulou, A G ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

Charge trapping; Memory effects; Silicon nanocrystals

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC POTENTIAL; ELECTRON TRAPS; GROWTH (MATERIALS); NANOSTRUCTURED MATERIALS; SILICA; ULSI CIRCUITS;

CHARGE TRAPPING; MEMORY EFFECTS; SILICON NANOCRYSTALS;

SILICON;

EID: 1642345271     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(02)00695-5     Document Type: Conference Paper

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