Size classification of silicon nanocrystals

Applied Physics Letters

Volumn 68, Issue 22, 1996, Pages 3162-3164

  Camata, Renato P ^a   Atwater, Harry A ^a   Vahala, Kerry J ^a   Flagan, Richard C ^b  

^a California Institute of Technology   (United States)

^b California Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000846067     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.115811     Document Type: Article

References (15)

1. L. T. Canham, Appl. Phys. Lett. AIP 57, 1046 (1990).
2. Y. Maeda, N. Tsukamoto, Y. Yazawa, Y. Kanemitsu, and Y. Matsumoto, Appl. Phys. Lett. AIP 59, 3168 (1991).
3. H. A. Atwater, K. V. Shcheglov, S. S. Wong, K. J. Vahala, R. C. Flagan, M. L. Brongersma, and A. Polman, Mater. Res. Soc. Symp. Proc. INS 316, 409 (1994).
4. W. L. Wilson, P. F. Szajowski, and L. E. Brus, Science INS 262, 1242 (1993).
5. S. Schuppler, S. L. Friedman, and M. A. Marcus, Phys. Rev. B AIP 52, 4910 (1995).
6. W. E. Carlos and S. M. Prokes, J. Vac. Sci. Technol. AIP 13, 1653 (1995).
7. T. Takagahara and K. Takeda, Phys. Rev. B AIP 46, 15578 (1992).
8. B. Delley and E. F. Steigmeier, Phys. Rev. B AIP 47, 1397 (1993).
9. C. B. Murray, D. J. Norris, and M. G. Bawendi, J. Am. Chem. Soc. INS 115, 8706 (1993).
10. W. A. Saunders, P. C. Sercel, R. B. Lee, H. A. Atwater, K. J. Vahala, R. C. Flagan, and E. J. Escorcia-Aparcio, Appl. Phys. Lett. AIP 63, 1549 (1993).
11. A. Wiendensohler, J. Aerosol Sci. 19, 387 (1988).
12. S.-H. Zhang, Y. Akutsu, L. M. Russell, R. C. Flagan, and J. H. Seinfeld, Aerosol Sci. Technol. 23, 357 (1995).
13. J. Kesten, A. Reineking, and J. Porstendorfer, Aerosol Sci. Technol. 15, 107 (1991).
14. J. Fernandez de la Mora, S. V. Hering, N. Rao, and P. H. McMurray, J. Aerosol Sci. 21, 169 (1990).
15. See, for example, Y.-S. Cheng, H.-C. Yeh, and G. M. Nanapilly, Am. Ind. Hyg. Assoc. J. 42, 605 (1981).