EUVL masks: Requirements and potential solutions

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 1, 2002, Pages 134-149

  Hector, Scott D ^a  

^a MOTOROLA INC   (United States)

Author keywords

Cost of ownership; Extreme ultraviolet lithography; Mask blanks; Masks; Multilayer coatings; Standards

Indexed keywords

DEFECTS; LIGHT ABSORPTION; MASKS; MULTILAYERS; PHOTOLITHOGRAPHY; THERMAL EXPANSION;

PHOTOMASKS;

ULTRAVIOLET RADIATION;

EID: 0036378919     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.472284     Document Type: Conference Paper

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