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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4409, Issue , 2001, Pages 669-680

EUVL masks: Paving the path for commercialization

(2) Mangat, P J S a Hector, S D a

a MOTOROLA INC (United States)

Author keywords

Extreme ultra violet lithography (EUVL); Mask exposures; Next generation lithography (NGL) Reticles; NGL mask manufacturing

Indexed keywords

COMPUTER SIMULATION; LITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE; ULTRAVIOLET RADIATION;

EXTREME ULTRA-VIOLET LITHOGRAPHY; LOW THERMAL EXPANSION MATERIAL; NEXT GENERATION LITHOGRAPHY; THERMOPHERETIC PROTECTION;

MASKS;

EID: 0035188072 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.438382 Document Type: Conference Paper

Times cited : (3)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.