Mechanical modeling of the reticle and chuck for EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 1, 2002, Pages 194-204

  Martin, Carl J ^a   Mikkelson, Andrew R ^a   Tejeda, Richard O ^a   Engelstad, Roxann L ^a   Lovell, Edward G ^a   Blaedel, Kenneth L ^b   Claudet, Andre A ^b  

^a University of Wisconsin Madison   (United States)

^b LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

Electrostatic chuck; EUV lithography; EUV reticles; Exposure; Finite elements; Particle contamination; Thermomechanical response

Indexed keywords

COATING TECHNIQUES; FINITE ELEMENT METHOD; MULTILAYERS; PHOTOLITHOGRAPHY;

THERMOMECHANICAL RESPONSE;

ULTRAVIOLET RADIATION;

EID: 0036381374     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.472290     Document Type: Article

References (5)

1. W. A. Tong, et al., "EUV printing results of a low thermal expansion material (LTEM) mask, " Emerging Lithographic Technologies IV, SPIE, 3997, pp. 855-866, 2000.
2. J. Benschop, U. Dinger, and D. Ockwell, "EUCLIDES: first phase completed!, " Emerging Lithographic Technologies IV, SPIE, 3997, pp. 34-47, 2000.
3. A. R. Mikkelson, R. L. Engelstad and E. G. Lovell, "Determination of image placement accuracy due to EUV mask fabrication procedures, " to appear in Microelectronic Engineering, 2001.
4. S. E. Gianoulakis and A. K. Ray-Chaudhuri, "Thermal management of EUV lithography masks using low expansion glass substrates, " Emerging Lithographic Technologies III, SPIE, 3696, pp. 598-605, 1999.
5. C. Martin, R. Engelstad and E. Lovell, "Thermomechanical Modeling of the EUV Reticle during Exposure, " Emerging Lithographic Technologies V, SPIE, 4343, pp. 515-523, 2001.