EUV mask patterning approaches

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue I, 1999, Pages 309-313

  Yan, Pei yang ^a   Zhang, Guojing ^a   Kofron, Patrick ^a   Chow, Jenn ^a   Stivers, Alan ^a   Tejnil, Edita ^a   Cardinale, Gregory ^a   Kearney, Patrick ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGING TECHNIQUES; MASKS; MULTILAYERS; PROCESS ENGINEERING; SILICON WAFERS; ULTRAVIOLET RADIATION;

DAMASCENE PROCESS FLOW; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); MASK FABRICATION PROCESS FLOWS; MULTILAYER REFLECTIVE BLANKS; SUBTRACTIVE METAL FLOW;

PHOTORESISTS;

EID: 0032678336     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351102     Document Type: Conference Paper

References (5)