Tantalum nitride films for the absorber material of reflective-type EUVL mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue 1, 2001, Pages 760-770

  Takahashi, M ^a   Ogawa, T ^a   Hoshino, E ^a   Hoko, H ^a   Lee, B T ^a   Chiba, A ^a   Yamanashi, H ^a   Okazaki, S ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

Absorber material; Amorphous like; DUV; EUVL; Low stress; Mask; Reflectivity; Sputtering; TaxN

Indexed keywords

LIGHT ABSORPTION; LIGHT REFLECTION; MULTILAYERS; OPTICAL FILMS; PHOTOLITHOGRAPHY; SPUTTERING; STRESS ANALYSIS; TANTALUM COMPOUNDS;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); TANTALUM NITRIDE FILMS;

MASKS;

EID: 0034759382     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436702     Document Type: Article

References (7)