Advances in low-defect multilayers for EUVL mask blanks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 1, 2002, Pages 173-181

  Folta, James A ^a   Davidson, J Courtney ^a   Larson, Cindy C ^a   Walton, Christopher C ^a   Kearney, Patrick A ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

Defect; Defect detection; Defect mitigation; EUVL; Extreme Ultraviolet Lithography; Mask; Multilayer; Next Generation Lithography; NGL

Indexed keywords

COATING TECHNIQUES; ETCHING; ION BEAMS; MASKS; MULTILAYERS; PHOTOLITHOGRAPHY; POLYSTYRENES; SILICON WAFERS; THERMAL EXPANSION;

POLYSTYRENE LATEX SPHERE (PSL);

ULTRAVIOLET RADIATION;

EID: 0036380184     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.472287     Document Type: Conference Paper

References (16)

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