EUV mask absorber defect repair with focused ion beam

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3546, Issue , 1998, Pages 206-213

  Yan, Pei yang ^a   Yan, Souping ^a   Zhang, Guojing ^a   Kearney, Patrick ^a   Richards, John ^a   Kofron, Patrick ^a   Chow, Jenn ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; GALLIUM; ION BEAMS; ION BOMBARDMENT; MULTILAYERS; PHOTORESISTS; REFLECTIVE COATINGS; SILICA; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET (EUV) MASKS; FOCUSED ION BEAM (FIB) REPAIR;

MASKS;

EID: 0032289065     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.332828     Document Type: Conference Paper

References (2)