Review of progress in extreme ultraviolet lithography masks

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2612-2616

  Hector, Scott ^a   Mangat, Pawitter ^b  

^a MOTOROLA INC   (United States)

^b MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CRYSTAL DEFECTS; MASKS; MULTILAYERS; SILICON WAFERS; SURFACE ROUGHNESS; THERMAL EXPANSION; THERMOPHORESIS;

DEFECT DENSITY; THERMOPHORETIC PROTECTION; ULTRAVIOLET LITHOGRAPHY;

LITHOGRAPHY;

EID: 0035519442     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1408957     Document Type: Article

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