Predictive model of the cost of extreme ultraviolet lithography masks

Proceedings of SPIE- The International Society for Optical Engineering

Volumn 4186, Issue , 2001, Pages 733-748

  Hector, S D ^a   Kearney, P A ^a   Montcalm, C ^a   Folta, J A ^a   Walton, C C ^a   Tong, W M ^a   Taylor, J S ^a   Yan, P Y ^a   Gwyn, C ^a  

^a MOTOROLA INC   (United States)

Author keywords

Cost of ownership; Extreme ultraviolet lithography; Masks; Multilayers; Next generation lithography; Yield modeling

Indexed keywords

COSTS; MASKS; OPTICAL COATINGS; PATTERN MATCHING; PHASE SHIFT; SEMICONDUCTOR DEVICE MANUFACTURE; SUBSTRATES; THERMAL EXPANSION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

PHOTOLITHOGRAPHY;

EID: 0035043193     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.410754     Document Type: Article

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