Electrostatic mask protection for extreme ultraviolet lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 1, 2002, Pages 316-320

  Moors, Roel ^a   Heerens, Gert Jan ^b  

^a ASML   (Netherlands)

^b TNO   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; CAPACITORS; CHARGED PARTICLES; CONTAMINATION; ELECTRIC FIELDS; ELECTROSTATICS; MASKS; PERMITTIVITY; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

PHOTOLITHOGRAPHY;

EID: 0036121002     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1446451     Document Type: Conference Paper

References (4)