Masks for extreme ultraviolet lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3546, Issue , 1998, Pages 184-193

  Vernon, Stephen P ^a   Kearney, Patrick A ^a   Tong, William M ^a   Prisbrey, Shon ^a   Larson, Cindy ^a   Moore, Craig E ^a   Weber, Frank W ^a   Cardinale, Greg ^a   Yan, Pei Yan,g ^a   Hector, Scott D ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT ABSORPTION; LIGHT REFLECTION; MULTILAYERS; PHOTORESISTS; REFLECTIVE COATINGS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY;

MASKS;

EID: 0032300947     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.332826     Document Type: Conference Paper

References (24)