Design and fabrication of broadband EUV multilayer mirrors

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 2, 2002, Pages 509-515

  Kuhlmann, Thomas ^a   Yulin, Sergiy ^a   Feigl, Torsten ^a   Kaiser, Norbert ^a   Bernitzki, Helmut ^b   Lauth, Hans ^b  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^b JENOPTIK Laser Optik Systeme GmbH   (Germany)

Author keywords

Broadband mirrors; Coating designs; EUV; Metrology; Mo Si; Multilayers; Plasma sources

Indexed keywords

BANDWIDTH; FABRICATION; FUNCTIONS; LIGHT REFLECTION; MAGNETRON SPUTTERING; MULTILAYERS; OPTICAL DESIGN; PLASMA SOURCES; ULTRAVIOLET RADIATION;

MULTILAYER MIRRORS;

MIRRORS;

EID: 0036381370     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.472327     Document Type: Article

References (13)

1. Y. Vladimirsky (Edt.), "Emerging Lithographic Technologies III", Proc. SPIE 3676, 1999; E.A. Dobisz (Edt.), "Emerging Lithographic Technologies IV", Proc. SPIE 3997, 2000; E.A. Dobisz (Edt.), "Emerging Lithographic Technologies V", Proc. SPIE 4343, 2001
2. Y. Vladimirsky (Edt.), "Emerging Lithographic Technologies III", Proc. SPIE 3676, 1999; E.A. Dobisz (Edt.), "Emerging Lithographic Technologies IV", Proc. SPIE 3997, 2000; E.A. Dobisz (Edt.), "Emerging Lithographic Technologies V", Proc. SPIE 4343, 2001
3. Y. Vladimirsky (Edt.), "Emerging Lithographic Technologies III", Proc. SPIE 3676, 1999; E.A. Dobisz (Edt.), "Emerging Lithographic Technologies IV", Proc. SPIE 3997, 2000; E.A. Dobisz (Edt.), "Emerging Lithographic Technologies V", Proc. SPIE 4343, 2001
4. K. Bergmann, G. Schriever, O. Rosier, M. Müller, W. Neff, R. Lebert, "Highly repetitive, extreme ultraviolet radiation source based on a gas-discharge plasma", Applied Optics 38, 5413-5417, 1999
5. R. Souffli, E. Spiller, M.A. Schmidt, J.C. Davidson, R.F. Grabner, E.M. Gullikson, B.B. Kaufmann, S. Mrowka, S.L. Baker, H.N. Chapman, R.M. Hudyma, J.S. Taylor, C.C. Walton, C. Montcalm, J.A. Folta, "Multilayer optics for an extreme ultraviolet lithography tool 70 nm resolution", Proc. SPIE 4343, 51-59, 2001
6. I.V. Kozhevnikov, I.N. Bukreeva, E. Ziegler, "Design of x-ray supermirrors", Nucl. Instr. Meth. Phys. Res. A 460, 424-443, 2001.
7. P. Böni, "Supermirror-based beam devices", Physica B 234-236, 1038-1043, 1997.
8. K.D. Joensen, P. Voutov, A. Szentgyorgyi, J. Roll, P. Gorenstein, P. Hoghoj, F.E. Christensen, "Design of grazing-incidence multilayer supermirrors for hard x-ray reflectors", Appl. Optics 34, 7935-7944, 1995.
9. Z. Wang, J. Cao, A.G. Michette, "Depth-graded multilayer x-ray optics with broad angular response" Optics Communications 177, 25-32, 2000.
10. V.V. Protopov, V.A. Kalnov, "X-ray multilayer mirrors with an extended angular range", Optics Communications 158, 127-140, 1998.
11. Z. Wang, A.G. Michette, "Broadband multilayer mirrors for optimum use of a soft x-ray source output", J. Opt. A: Pure Appl. Opt. 2, 452-457, 2000.
12. B.L. Henke, E.M. Gullikson, J.C. Davis "X-ray interactions: photoabsorption, scattering, transmission, and reflection at E=50-30000 eV, Z=1-92", Atomic Data and Nuclear Data Tables 54 (no.2), 181-342, 1993.
13. http://www-cxro.lbl.gov/optical_constants/