Thermal expansion behavior of proposed EUVL substrate materials

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 1, 2002, Pages 462-468

  Mitra, Ina ^a   Davis, Mark J ^b   Alkemper, Jochen ^a   Müller, Rolf ^a   Kohlmann, Heiko ^a   Aschke, Lutz ^c   Mörsen, Ewald ^c   Ritter, Simone ^a   Hack, Hrabanus ^a   Pannhorst, Wolfgang ^a  

^a SCHOTT AG   (Germany)

^b Schott Glass Technologies Inc   (United States)

^c Schott Lithotec AG   (Germany)

Author keywords

CTE homogeneity; EUVL; Thermal expansion; Zerodur

Indexed keywords

ERROR ANALYSIS; MASKS; PARAMETER ESTIMATION; REFRACTIVE INDEX; THERMAL EXPANSION; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

PHOTOLITHOGRAPHY;

EID: 0010443633     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.472322     Document Type: Article

References (4)

1. H. Bach. Ed., Low Thermal Expansion Glass Ceramics, Springer, Berlin, 1995
2. SEMI standard P 37: "Specification for Extreme Ultraviolet Lithography Mask Substrates"
3. th Thermal Expansion Symposium, Pittsburgh/PA, P.S. Gaal and D.E. Apostolescu eds., 1997
4. M. J. Davis, A. J. Marker III, L. Aschke, F. Schubert, E. Moersen, H. Kohlmann, I. Mitra, J. Alkemper, R. Müller, J. S. Taylor, K. L. Blaedel, S. D. Hector: "Thermal expansion and internal quality of a proposed EUVL mask substrate material: Zerodur", SPIE's 46th Annual Meeting, 29 July - 3 Aug. 2001, San Diego/CA