Recent developments in EUV reflectometry at the Advanced Light Source

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue , 2001, Pages 363-373

  Gullikson, E M ^a   Mrowka, S ^a   Kaufmann, B B ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

EUV lithography; Metrology; Multilayer reflectivity; Reflectometry

Indexed keywords

COATINGS; LIGHT SCATTERING; LIGHT SOURCES; MASKS; MULTILAYERS; REFLECTOMETERS;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; EXTREME ULTRAVIOLET (EUV) REFLECTOMETRY;

PHOTOLITHOGRAPHY;

EID: 0034768492     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436712     Document Type: Conference Paper

References (8)