EUV mask fabrication with Cr absorber

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 76-82

  Mangat, Pawitter ^a   Hector, Scott ^a   Rose, Stewart ^a   Cardinale, Greg ^a   Tejnil, Edita ^a   Stivers, Alan ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; ION BEAMS; LIGHT ABSORPTION; LIGHT EMISSION; MIRRORS; PHOTORESISTS; REACTIVE ION ETCHING; SILICON COMPOUNDS; SILICON WAFERS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); NEXT GENERATION LITHOGRAPHY (NGL);

MASKS;

EID: 0033685424     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)