Ion beam sputter deposition of low defect EUV mask blanks on 6 inch LTEM substrates in a real production environment

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 2, 2002, Pages 503-508

  Becker, H ^a   Aschke, L ^a   Schubert, B ^a   Krieger, J ^a   Lenzen, F ^a   Yulin, S ^b   Feigl, T ^b   Kuhlmann, T ^b   Kaiser, N ^b  

^a Schott Lithotec AG   (Germany)

^b Fraunhoferlnstitut für Angewandte Optik und Feinmechanik ^*  (Germany)

Author keywords

EUVL; IBS; LTEM; Mask blanks; Mo Si; Multilayer mirrors

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEFECTS; ION BEAM ASSISTED DEPOSITION; MASKS; MIRRORS; MOLYBDENUM; MULTILAYERS; STRESS ANALYSIS; THERMAL EXPANSION; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION; X RAY SCATTERING;

ION BEAM SPUTTER DEPOSITION;

SPUTTER DEPOSITION;

EID: 0036378869     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.472326     Document Type: Article

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