Thermal management of EUV lithography masks using low expansion glass substrates

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue II, 1999, Pages 598-605

  Gianoulakis, Steven E ^a   Ray Chaudhuri, Avijit K ^a   Hector, Scott D ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFORMATION; DIMENSIONAL STABILITY; FUSED SILICA; GLASS; MASKS; MULTILAYERS; NANOTECHNOLOGY; REFLECTIVE COATINGS; SILICON WAFERS; THERMAL EXPANSION; TITANIUM OXIDES; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); REFLECTIVE MASKS;

PHOTOLITHOGRAPHY;

EID: 0032624669     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351133     Document Type: Conference Paper

References (6)