Functionalization of oxide-free silicon surfaces

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 31, Issue 5, 2013, Pages

  Debenedetti, William J I ^a   Chabal, Yves J ^a  

^a The University of Texas at Dallas   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION METHODS; HYDROGEN-TERMINATED SILICON SURFACES; LOW ENERGY ION SCATTERING; MICROELECTRONIC INDUSTRY; ORGANIC FUNCTIONALIZATION; SELECTIVE FUNCTIONALIZATION; SILICON CARBON BOND; SILICON NANOPARTICLES;

DEFECTS; GRAFTING (CHEMICAL); HYDROGEN; HYDROGEN BONDS; HYDROSILYLATION; INTERFACES (MATERIALS); LIGHT ABSORPTION; MICROELECTRONICS; NANOPARTICLES; PHOTOELECTRONS; SILICON; SILICON OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY;

SURFACE STRUCTURE;

EID: 84885129420     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.4819406     Document Type: Review

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