Chlorination of hydrogen-terminated silicon (111) surfaces

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 4, 2005, Pages 1100-1106

  Rivillon, Sandrine ^a   Chabal, Yves J ^a   Webb, Lauren J ^b   Michalak, David J ^b   Lewis, Nathan S ^b   Halls, Mathew D ^c   Raghavachari, Krishnan ^c  

^a RUTGERS UNIVERSITY   (United States)

^b California Institute of Technology   (United States)

^c INDIANA UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BENDING VIBRATIONS; CHLORINE GAS; HYDROGEN-TERMINATED SILICON;

CHLORINATION; HYDROGEN; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICON;

EID: 31144457510     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1861941     Document Type: Conference Paper

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