An atomistic mechanism for the production of two- and three-dimensional etch hillocks on Si(111) surfaces

Journal of Chemical Physics

Volumn 111, Issue 15, 1999, Pages 6970-6981

  Flidr, Jaroslav ^a,d   Huang, Yi Chiau ^b   Hines, Melissa A ^c  

^a Department of Obstetrics Gynecology   (United States)

^b Cornell University   (United States)

^c Department of Molecular Biology and Genetics   (United States)

^d UNIVERSITY OF SOUTHERN CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001017962     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.479990     Document Type: Article

References (45)

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24. -7:∝:∞}.
25. bnt=0.1. 23 The movies can be viewed at the Hines group web site in Cornell Chemistry. The current address is 〈http://www.chem.cornell.edu/∼mah11/ Hillock.html〉.
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