Effect of solvents and concentration on the formation of a self-assembled monolayer of octadecylsiloxane on silicon (001)

Langmuir

Volumn 19, Issue 4, 2003, Pages 1182-1188

  Rozlosnik, Noémi ^a,b   Gerstenberg, Michael C ^a,c   Larsen, Niels B ^a  

^a TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^b EÖTVÖS LORÁND UNIVERSITY   (Hungary)

^c NOVO NORDISK A S   (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; ELLIPSOMETRY; HEPTANE; HYDROPHILICITY; HYDROPHOBICITY; ORGANIC SOLVENTS; SILICON; SILICON COMPOUNDS; SOLUTIONS; TOLUENE; X RAY ANALYSIS;

DODECANE; OCTADECYLSILOXANE; SELF-ASSEMBLED MONOLAYER; SILICON OXIDE; X RAY REFLECTOMETRY;

MONOLAYERS;

EID: 0037452743     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la025906s     Document Type: Article

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