Self-propagating reaction produces near-ideal functionalization of Si(100) and flat surfaces

Journal of Physical Chemistry C

Volumn 116, Issue 35, 2012, Pages 18920-18929

  Hines, Melissa A ^a   Faggin, Marc F ^a   Gupta, Ankush ^a   Aldinger, Brandon S ^a   Bao, Kun ^a  

^a Department of Obstetrics Gynecology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL FUNCTIONALIZATION; DIHYDRIDES; ETCH MORPHOLOGY; FLAT SURFACES; FUNCTIONALIZATIONS; FUNCTIONALIZED; HYDROGEN TERMINATION; KINETIC MONTE CARLO SIMULATION; MICRO-ELECTRONIC DEVICES; REACTION MECHANISM; SELF-PROPAGATING; SELF-PROPAGATING REACTION; SI(1 0 0); SI(100) SURFACE; SILANONE; SILICON ATOMS; SITE-SPECIFIC; STERICALLY HINDERED STRUCTURE; STRAIN RELEASE;

HYDROGEN; INFRARED SPECTROSCOPY; MICROELECTRONICS; MORPHOLOGY; REACTION INTERMEDIATES; REACTION KINETICS; SCANNING TUNNELING MICROSCOPY; SILICON;

SURFACE REACTIONS;

EID: 84865989448     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp306477x     Document Type: Article

References (48)

1. Atalla, M. M.; Tannenbaum, E.; Scheibner, E. J. Bell Syst. Tech. J. 1959, 38, 749-783
2. Higashi, G. S.; Chabal, Y. J.; Trucks, G. W.; Raghavachari, K. Appl. Phys. Lett. 1990, 56, 656-658
3. Linford, M. R.; Fenter, P.; Eisenberger, P. M.; Chidsey, C. E. D. J. Am. Chem. Soc. 1995, 117, 3145-3155
4. Bansal, A.; Li, X.; Lauermann, I.; Lewis, N. S.; Yi, S. I.; Weinberg, W. H. J. Am. Chem. Soc. 1996, 118, 7225-7226
5. Boukherroub, R.; Morin, S.; Sharpe, P.; Wayner, D. D. M.; Allongue, P. Langmuir 2000, 16, 7429-7434
6. Buriak, J. M. Chem. Rev. 2002, 102, 1271-1308
7. Michalak, D. J.; Amy, S. R.; Aureau, D.; Dai, M.; Estéve, A.; Chabal, Y. J. Nat. Mater. 2010, 9, 266-271
8. Vilan, A.; Yaffe, O.; Biller, A.; Salomon, A.; Kahn, A.; Cahen, D. Adv. Mater. 2010, 22, 140-159
9. Wayner, D. D. M.; Wolkow, R. A. J. Chem. Soc., Perkin Trans. 2 2002, 23-34
10. Hamers, R. J. Annu. Rev. Anal. Chem. 2008, 1, 707-736
11. Eves, B. J.; Sun, Q.-Y.; Lopinski, G. P.; Zuilhof, H. J. Am. Chem. Soc. 2004, 126, 14318-14319
12. Yaffe, O.; Scheres, L.; Puniredd, S. R.; Stein, N.; Biller, A.; Lavan, R. H.; Shpaisman, H.; Zuilhof, H.; Haick, H.; Cahen, D.; Vilan, A. Nano Lett. 2009, 9, 2390-2394
13. Maboudian, R.; Carraro, C. Annu. Rev. Phys. Chem. 2004, 55, 35-54
14. Salomon, A.; Boecking, T.; Chan, C.; Amy, F.; Girshevitz, O.; Cahen, D.; Kahn, A. Phys. Rev. Lett. 2005, 95, 266807
15. Janshoff, A.; Dancil, K.-P. S.; Steinem, C.; Greiner, D. P.; Lin, V. S.-Y.; Gurtner, C.; Motesharei, K.; Sailor, M. J.; Ghadiri, M. R. J. Am. Chem. Soc. 1998, 120, 12108-12116
16. Scheres, L.; Giesbers, M.; Zuilhof, H. Langmuir 2010, 26, 10924-10929
17. Clark, I. T.; Aldinger, B. S.; Gupta, A.; Hines, M. A. J. Phys. Chem. C 2010, 114, 423-428
18. Aldinger, B. S.; Clark, I. T.; Gupta, A.; Hines, M. A. J. Appl. Phys. 2010, 107, 103520
19. Clark, I. T.; Aldinger, B. S.; Gupta, A.; Hines, M. A. J. Chem. Phys. 2008, 128, 144711
20. Faggin, M. F.; Hines, M. A. Rev. Sci. Instrum. 2004, 75, 4547-4553
21. Kolasinski, K. W. J. Electrochem. Soc. 2005, 152, J99-J104
22. Gupta, A.; Aldinger, B. S.; Faggin, M. F.; Hines, M. A. J. Chem. Phys. 2010, 133, 044710
23. Swartzentruber, B. S.; Schacht, M. Surf. Sci. 1995, 322, 83-89
24. DeMattei, R. C.; Feigelson, R. S. Electrochem. Semiconductors Electron. 1992, 1-52
25. Hines, M. A. Annu. Rev. Phys. Chem. 2003, 54, 29-56
26. Chabal, Y. J.; Higashi, G. S.; Raghavachari, K.; Burrows, V. A. J. Vac. Sci. Technol. A 1989, 7, 2104-2109
27. Endo, K.; Arima, K.; Hirose, K.; Kataoka, T.; Mori, Y. J. Appl. Phys. 2002, 91, 4065-4072
28. Northrup, J. E. Phys. Rev. B 1991, 44, 1419-1422
29. Freking, U.; Krüger, P.; Mazur, A.; Pollmann, J. Phys. Rev. B 2004, 69, 035315
30. Hines, M. A.; Chabal, Y. J.; Harris, T. D.; Harris, A. L. J. Chem. Phys. 1994, 101, 8055-8072
31. Allongue, P.; Kieling, V.; Gerischer, H. Electrochim. Acta 1995, 40, 13553-11360
32. Lublow, M.; Stempel, T.; Skorupska, K.; Muñoz, A. G.; Kanis, M.; Lewerenz, H. J. Appl. Phys. Lett. 2009, 93, 062112
33. Allongue, P.; Costa-Kieling, V.; Gerischer, H. J. Electrochem. Soc. 1993, 140, 1018-1026
34. Eaborn, C.; Stanczyk, W. A. J. Chem. Soc. Perkin Trans. 2 1984, 2099-2103
35. Steward, O. W.; Williams, J. L. J. Organomet. Chem. 1988, 341, 199-211
36. Gole, J. L.; Dudel, F. P.; Grantier, D.; Dixon, D. A. Phys. Rev. B 1997, 56, 2137-2153
37. Wolkin, M. V.; Jorne, J.; Fauchet, P. M.; Allan, G.; Delerue, C. Phys. Rev. Lett. 1999, 82, 197-200
38. Chabal, Y. J.; Raghavachari, K.; Zhang, X.; Garfunkel, E. Phys. Rev. B 2002, 66, 161315(R)
39. Hemeryck, A.; Mayne, A. J.; Richard, N.; Esteve, A.; Chabal, Y. J.; Djafari Rouhani, M.; Dujardin, G.; Comtet, G. J. Chem. Phys. 2007, 126, 114707
40. Zhou, F.; Head, J. D. J. Phys. Chem. B 2000, 104, 9981-9986
41. Zwijnenburg, M. A.; Sokol, A. A.; Sousa, C.; Bromley, S. T. J. Chem. Phys. 2009, 131, 034705
42. Trucks, G. W.; Raghavachari, K.; Higashi, G. S.; Chabal, Y. J. Phys. Rev. Lett. 1990, 65, 504-507
43. Judge, J. S. J. Electrochem. Soc. 1971, 118, 1772-1775
44. Williams, D. E.; Craycroft, D. J. J. Phys. Chem. 1987, 91, 6365-6373
45. Sacher, E.; Yelon, A. Phys. Rev. Lett. 1991, 66, 1647
46. Corriu, R. Organomet. Chem. Rev. 1980, 9, 357-373
47. Anh, N. T.; Minot, C. J. Am. Chem. Soc. 1980, 102, 103-107
48. Pietsch, G. J.; Higashi, G. S.; Chabal, Y. J. Appl. Phys. Lett. 1994, 64, 3115-3117