Nanopatterning Si(111) surfaces as a selective surface-chemistry route

Nature Materials

Volumn 9, Issue 3, 2010, Pages 266-271

  Michalak, David J ^a,d,e   Amy, Sandrine Rivillon ^a,d   Aureau, Damien ^b   Dai, Min ^a   Estève, Alain ^c   Chabal, Yves J ^b  

^a RUTGERS UNIVERSITY   (United States)

^b The University of Texas at Dallas   (United States)

^c UNIVERSITÉ DE TOULOUSE   (France)

^d INTEL CORPORATION   (United States)

^e AIR PRODUCTS AND CHEMICALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

SELF ASSEMBLY; SILICON; SURFACE CHEMISTRY;

H-TERMINATED SURFACE; HOMOGENEOUS SURFACES; METHOXY GROUP; NANOPATTERNING; SELECTIVE SURFACE; SI SUBSTRATES; STERIC INTERACTIONS; WET CHEMICALS;

SURFACE REACTIONS;

SILICON;

ARTICLE; CHEMICAL STRUCTURE; CHEMISTRY; INFRARED SPECTROPHOTOMETRY; NANOTECHNOLOGY; SURFACE PROPERTY;

MODELS, MOLECULAR; NANOTECHNOLOGY; SILICON; SPECTROPHOTOMETRY, INFRARED; SURFACE PROPERTIES;

EID: 77249131154     PISSN: 14761122     EISSN: 14764660     Source Type: Journal    
DOI: 10.1038/nmat2611     Document Type: Article

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