Si(100) etching in aqueous fluoride solutions: Parallel etching reactions lead to pH-dependent nanohillock formation or atomically flat surfaces

Journal of Physical Chemistry C

Volumn 116, Issue 40, 2012, Pages 21499-21507

  Aldinger, Brandon S ^a   Hines, Melissa A ^a  

^a Department of Obstetrics Gynecology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AQUEOUS FLUORIDE SOLUTIONS; ATOMICALLY FLAT SURFACE; ATOMICALLY SMOOTH SURFACE; BUFFERED OXIDE ETCHANTS; ETCHED SURFACE; MORPHOLOGICAL STRUCTURES; MORPHOLOGICAL TRANSITIONS; MULTISTEP REACTIONS; NANO SCALE; PARALLEL ETCHING; PH-DEPENDENT; REACTION CHANNELS; ROUGH SURFACES; SI(1 0 0); SI(100) SURFACE; SILANONE; SMOOTH SURFACE;

INFRARED SPECTROSCOPY; MONOLAYERS; SCANNING TUNNELING MICROSCOPY; SILICON;

SURFACE REACTIONS;

EID: 84867540128     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp308064s     Document Type: Article

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