Controlled, low-coverage metal oxide activation of silicon for organic functionalization: Unraveling the phosphonate bond

Langmuir

Volumn 28, Issue 50, 2012, Pages 17494-17505

  Thissen, Peter ^a   Vega, Abraham ^a   Peixoto, Tatiana ^a   Chabal, Yves J ^a  

^a The University of Texas at Dallas   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION GEOMETRIES; AQUEOUS ENVIRONMENT; CHEMICAL GRAFTING; FUNCTIONALIZATIONS; GRAFTING PROCESS; HIGH TEMPERATURE; INFLUENCING PARAMETERS; METAL OXIDES; MODEL SURFACE; OH GROUP; ORGANIC FUNCTIONALIZATION; ORGANIC MOLECULES; OXIDE SURFACE; PHOSPHONATES; SEMI-CONDUCTOR SURFACES; SI SURFACES; THERMODYNAMICALLY STABLE; ULTRATHIN LAYERS; VAPOR PHASE DEPOSITION; VAPOR PHASE METHODS; WET CHEMICAL PROCESSING; WET-CHEMICAL METHOD;

ADSORPTION; ALUMINUM; ATOMIC LAYER DEPOSITION; CHEMICAL INDUSTRY; DEPOSITION; METALLIC COMPOUNDS; MOLECULES; MONOLAYERS; SILICON OXIDES; VAPORS;

GRAFTING (CHEMICAL);

EID: 84871344734     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la3038457     Document Type: Article

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