Effect of surface chemistry on mechanical energy dissipation: Silicon oxidation does not inherently decrease the quality factor

Journal of Physical Chemistry C

Volumn 112, Issue 5, 2008, Pages 1473-1478

  Richter, Amy M ^a   Sengupta, Debodhonyaa ^a   Hines, Melissa A ^a  

^a Department of Obstetrics Gynecology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DODECYL ALDEHYDES; MECHANICAL ENERGY; QUALITY FACTORS;

ENERGY DISSIPATION; MONOLAYERS; OXIDATION; SURFACE CHEMISTRY;

SILICON;

EID: 39649085366     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp073967z     Document Type: Article

References (36)

1. Ilic, B.; Craighead, H. G.; Krylov, S.; Senaratne, W.; Ober, C.; Neuzil, P. J. Appl. Phys. 2004, 95, 3694.
2. Yang, Y. T.; Callegari, C.; Feng, X. L.; Ekinci, K. L.; Roukes, M. L. Nano Lett. 2006, 6, 583.
3. Ekinci, K. L.; Yang, Y. T.; Roukes, M. L. J. Appl. Phys. 2004, 95, 2682.
4. Mihailovich, R. E.; MacDonald, N. C. Sens. Actuators, A 1995, 50, 199.
5. Carr, D. W.; Evoy, S.; Sekaric, L.; Craighead, H. G.; Parpia, J. M. Appl. Phys. Lett. 1999, 75, 920.
6. Yang, J.; Ono, T.; Esashi, M. Appl Phys. Lett. 2000, 77, 3860.
7. Yang, J.; Ono, T.; Esashi, M. J. Vac Sci. Technol. B 2001, 19, 551.
8. Wang, Y.; Henry, J. A.; Zehnder, A. T.; Hines, M. A. J. Phys. Chem. B 2003, 107, 14270.
9. Henry, J. A.; Wang, Y.; Hines, M. A. Appl. Phys. Lett. 2004, 84, 1765.
10. Wang, Y.; Henry, J. A.; Sengupta, D.; Hines, M. A. Appl. Phys. Lett. 2004, 85, 5736.
11. Henry, J. A.; Wang, Y.; Sengupta, D.; Hines, M. A. J. Phys. Chem. B 2007, 111, 88.
12. Neuwald, U.; Hessel, H. E.; Feltz, A.; Memmert, U.; Behm, R. J. Appl. Phys. Lett. 1992, 60, 1307.
13. Royea, W. J.; Juang, A.; Lewis, N. S. Appl. Phys. Lett. 2000, 77, 1988.
14. Webb, L. J.; Lewis, N. S. J. Phys. Chem. B 2003, 107, 5404.
15. Sander, D.; Ibach, H. Phys. Rev. B: Condens. Matter Mater. Phys. 1991, 43, 4263.
16. Bhiladvala, R. B.; Wang, Z. J. Phys. Rev. E: Stat. Phys., Plasmas, Fluids, Relat. Interdiscip. Top. 2004, 69, 036307-1-5.
17. Braginsky, V. B.; Mitrofanov, V. P.; Panov, V. I. Systems with small dissipation; Ph.D. Thesis, University of Chicago, Chicago, IL, 1985.
18. Flidr, J.; Huang, Y.-C.; Hines, M. A. J. Chem. Phys. 1999, 111, 6970.
19. Cleland, G.; Horrocks, B. R.; Houlton, A. J. Chem. Soc. Faraday Trans. 1995, 91, 4001.
20. Boukherroub, R.; Morin, S.; Sharpe, P.; Wayner, D. D. M.; Allongue, P. Langmuir 2000, 16, 7429.
21. Linford, M. R.; Fenter, P.; Eisenberger, P. M.; Chidsey, C. E. D. J. Am. Chem. Soc. 1995, 117, 3145.
22. Chabal, Y. J. Surf. Sci. Rep. 1988, 8, 211.
23. Garcia, S. P.; Bao, H.; Hines, M. A. Phys. Rev. Lett. 2004, 93, 166102-1661-4.
24. Faggin, M. F.; Hines, M. A. Rev. Sci. Instrum. 2004, 75, 4547.
25. Jakob, P.; Chabal, Y. J. J. Chem. Phys. 1991, 95, 2897.
26. Parikh, A. N.; Allara, D. L.; Azouz, I. B.; Rondelez, F. J. Phys. Chem. B 1994, 98, 7577.
27. Snyder, R. G.; Strauss, H. L.; Elliger, C. A. J. Phys. Chem. 1982, 86, 5145.
28. Michalak, D. J.; Rivillon, S.; Chabal, Y. J.; Estéve, A.; Lewis, N. S. J. Phys. Chem. B 2006, 110, 20426.
29. Hacker, C. A.; Anderson, K. A.; Richter, L. J.; Richter, C. A. Langmuir 2005, 27, 882.
30. Higashi, G. S.; Chabal, Y. J. In Handbook of Semiconductor Wafer Cleaning Technology; Kern, W., Ed.; Noyes Publications: Park Ridge, NJ, 1993, pp 433-496.
31. Angermann, H. Anal. Bioanal Chem. 2002, 374, 676.
32. Gretarsson, A. M.; Harry, G. M. Rev. Sci. Instrum. 1999, 70, 4081.
33. Wang, Y. Ph.D. Thesis, Cornell University, Ithaca, NY, 2004.
34. Rivillon, S.; Brewer, R. T.; Chabal, Y. J. Appl. Phys. Lett. 2005, 87, 173118.
35. Mihailovich, R. E.; Parpia, J. M. Phys. Rev. Lett. 1992, 68, 3052.
36. Üstünel, H.; Roundy, D.; Arias, T. A. Phys. Rev. Lett. 2005, 94, 025503.