The formation of etch hillocks during step-flow etching of Si(111)

Chemical Physics Letters

Volumn 302, Issue 1-2, 1999, Pages 85-90

  Flidr, Jaroslav ^a   Huang, Yi Chiau ^b   Newton, Theresa A ^c   Hines, Melissa A ^c  

^a Department of Obstetrics Gynecology   (United States)

^b Cornell University   (United States)

^c Department of Molecular Biology and Genetics   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002724189     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0009-2614(99)00121-9     Document Type: Article

References (11)

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4. T.A. Newton, M.A. Hines, unpublished data.
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6. Jakob P., Chabal Y.J. J. Chem. Phys. 95:1991;2897. and references therein.
7. Flidr J., Huang Y.-C., Newton T.A., Hines M.A. J. Chem. Phys. 108:1998;5542.
8. Huang Y.C., Flidr J., Newton T.A., Hines M.A. J. Chem. Phys. 109:1998;5025.
9. K. Sanwal, Etching of Crystals, North-Holland, Amsterdam, 1987, ch. 4.
10. Burmeister J. J. Cryst. Growth. 11:1971;131.
11. van der Putte P., van Enckevort W.J.P., Giling L.J., Bloem J. J. Cryst. Growth. 43:1978;659.