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Volumn 6325, Issue , 2006, Pages

In situ infrared absorption spectroscopy for thin film growth by atomic layer deposition

Author keywords

Atomic Layer Deposition; FTIR spectroscopy; Gate oxides; High dielectrics; Insitu IR spectroscopy

Indexed keywords

ATOMIC LAYER DEPOSITION; GATE OXIDES; HIGH-Κ DIELECTRICS; MECHANISTIC INFORMATION;

EID: 33751109528     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.681331     Document Type: Conference Paper
Times cited : (5)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.