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Volumn 6325, Issue , 2006, Pages
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In situ infrared absorption spectroscopy for thin film growth by atomic layer deposition
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Author keywords
Atomic Layer Deposition; FTIR spectroscopy; Gate oxides; High dielectrics; Insitu IR spectroscopy
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Indexed keywords
ATOMIC LAYER DEPOSITION;
GATE OXIDES;
HIGH-Κ DIELECTRICS;
MECHANISTIC INFORMATION;
ABSORPTION SPECTROSCOPY;
DIELECTRIC MATERIALS;
FILM GROWTH;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
INFRARED SPECTROSCOPY;
SILICON;
THIN FILMS;
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EID: 33751109528
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.681331 Document Type: Conference Paper |
Times cited : (5)
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References (16)
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