X-ray studies of self-assembled organic monolayers grown on hydrogen-terminated Si(111)

Langmuir

Volumn 20, Issue 15, 2004, Pages 6252-6258

  Jin, Hua ^a   Kinser, C Reagan ^a   Bertin, Paul A ^b   Kramer, Donald E ^a   Libera, Joseph A ^a   Hersam, Mark C ^a   Nguyen, Sonbinh T ^b   Bedzyk, Michael J ^a  

^a Northwestern University   (United States)

^b NORTHWESTERN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

SURFACE DANGLING BONDS; X-RAY FLUORESCENCE (XRF); X-RAY REFLECTIVITY (XRR); X-RAY STANDING WAVES (XSW);

ATOMIC FORCE MICROSCOPY; ATOMS; FILM GROWTH; IRRADIATION; METHANOL; MOLECULES; SINGLE CRYSTALS; SOLUBILITY; SUBSTRATES; SURFACE ROUGHNESS; THICKNESS MEASUREMENT; ULTRAVIOLET DETECTORS; X RAY PHOTOELECTRON SPECTROSCOPY;

MONOLAYERS;

HYDROGEN; ORGANOSILICON DERIVATIVE; SILICON;

ARTICLE; ARTIFICIAL MEMBRANE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; METHODOLOGY; RADIATION EXPOSURE; SENSITIVITY AND SPECIFICITY; SPECTROMETRY; SURFACE PROPERTY; SYNTHESIS; ULTRAVIOLET RADIATION; X RAY; X RAY DIFFRACTION;

HYDROGEN; MEMBRANES, ARTIFICIAL; MICROSCOPY, ATOMIC FORCE; ORGANOSILICON COMPOUNDS; SENSITIVITY AND SPECIFICITY; SILICON; SPECTROMETRY, X-RAY EMISSION; SURFACE PROPERTIES; ULTRAVIOLET RAYS; X-RAY DIFFRACTION; X-RAYS;

EID: 3442884506     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la0496690     Document Type: Article

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