Surface hydride composition of plasma-synthesized si nanoparticles

Journal of Physical Chemistry C

Volumn 115, Issue 42, 2011, Pages 20375-20379

  Jariwala, Bhavin N ^a   Kramer, Nicolaas J ^b   Petcu, M Cristina ^b   Bobela, David C ^c   Sanden, M C M Van De ^b   Stradins, Paul ^c   Ciobanu, Cristian V ^a   Agarwal, Sumit ^a  

^a Department of Metallurgical and Materials Engineering   (United States)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATTENUATED TOTAL REFLECTIONS; CRYSTALLINE SI; DESORPTION RATE; GASPHASE; IN-SITU; LOW TEMPERATURES; PLASMA POWER; PLASMA-INDUCED; SI NANOPARTICLES; SURFACE HYDRIDES;

AMORPHOUS SILICON; CRYSTALLINE MATERIALS; DESORPTION; HYDRIDES; INFRARED SPECTROSCOPY; NANOPARTICLES; SILICON;

PLASMAS;

EID: 80054930447     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp2028005     Document Type: Article

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