Atomic layer deposition of tantalum-incorporated hafnium dioxide: Strategies to enhance thermal stability

Journal of the Electrochemical Society

Volumn 158, Issue 8, 2011, Pages

  Wang, Tuo ^a   Ekerdt, John G ^a  

^a The University of Texas at Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE PHASE; CRYSTALLIZATION MECHANISMS; HAFNIUM DIOXIDE; NANO-LAMINATES; NANOLAMINATE; NON-HOMOGENEOUS; ULTRATHIN LAYERS;

AMORPHOUS FILMS; ATOMIC LAYER DEPOSITION; CRYSTALLIZATION; HAFNIUM; HAFNIUM OXIDES; PERIODIC STRUCTURES; TANTALUM OXIDES; THERMODYNAMIC STABILITY; ULTRATHIN FILMS;

TANTALUM;

EID: 80051766853     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3598172     Document Type: Article

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