Structural phase transformation of Y2O3 doped Hf O2 films grown on Si using atomic layer deposition

Journal of Applied Physics

Volumn 105, Issue 10, 2009, Pages

  Majumder, Prodyut ^a   Jursich, Gregory ^b,c   Takoudis, Christos ^a,b  

^a 1120 Science and Engineering Offices   (United States)

^b University of Illinois at Chicago   (United States)

^c AIR LIQUIDE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINITY; CUBIC PHASE; FILM COMPOSITION; GRAZING INCIDENCE X-RAY DIFFRACTION; POST DEPOSITION ANNEALING; SPECTRAL ELLIPSOMETRY; STRONG CORRELATION; STRUCTURAL PHASE TRANSFORMATIONS; TETRAKIS; XPS ANALYSIS;

ANNEALING; ATOMIC LAYER DEPOSITION; ATOMS; FILM GROWTH; HAFNIUM; HAFNIUM COMPOUNDS; VAPOR DEPOSITION; WATER VAPOR; X RAY PHOTOELECTRON SPECTROSCOPY; YTTRIUM; YTTRIUM ALLOYS;

COMPOSITE FILMS;

EID: 66549099367     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3132830     Document Type: Article

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