Suppression of near-edge optical absorption band in sputter deposited Hf O2 - Al2 O3 nanolaminates containing nonmonoclinic Hf O2

Applied Physics Letters

Volumn 92, Issue 14, 2008, Pages

  Hoppe, E E ^a,b   Aita, C R ^a,b  

^a UNIVERSITY OF WISCONSIN MILWAUKEE   (United States)

^b University of Wisconsin Milwaukee   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; LIGHT ABSORPTION; POLYCRYSTALLINE MATERIALS; SPUTTER DEPOSITION; X RAY DIFFRACTION ANALYSIS;

NANOCRYSTALLINITY; NEAR-EDGE OPTICAL ABSORPTION BAND;

HAFNIUM COMPOUNDS;

EID: 42149177858     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2907331     Document Type: Article

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