Effect of composition on the thermal stability of sputter deposited hafnium aluminate and nitrided hafnium aluminate dielectrics on Si (100)

Journal of Applied Physics

Volumn 101, Issue 11, 2007, Pages

  Sivasubramani, P ^a   Kim, J ^a   Kim, M J ^a   Gnade, B E ^a   Wallace, R M ^a  

^a The University of Texas at Dallas   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONCENTRATION (PROCESS); HAFNIUM COMPOUNDS; NITROGEN; RAPID THERMAL ANNEALING; SPUTTER DEPOSITION; THERMODYNAMIC STABILITY; X RAY PHOTOELECTRON SPECTROSCOPY;

DETECTIBLE OUTDIFFUSION; HAFNIUM ALUMINATE;

DIELECTRIC MATERIALS;

EID: 34250652538     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2743818     Document Type: Article

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