X-ray photoelectron spectroscopy of thermal thin Ta 2 O 5 films on Si

Applied Surface Science

Volumn 135, Issue 1-4, 1998, Pages 71-82

  Atanassova, E ^a   Spassov, D ^a  

^a INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

Author keywords

Depth profile; Ta 2 O 5; Thermal oxidation; XPS

Indexed keywords

CHEMICAL BONDS; FILM GROWTH; OXIDES; SILICON; STOICHIOMETRY; TANTALUM COMPOUNDS; THERMOOXIDATION; X RAY PHOTOELECTRON SPECTROSCOPY;

TANTALUM PENTOXIDE;

DIELECTRIC FILMS;

EID: 0032475293     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00278-5     Document Type: Article

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