Materials challenges for sub-20nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7972, Issue , 2011, Pages

  Thackeray, James W ^a  

^a Dow Electronic Materials   (United States)

Author keywords

Chemical amplification; Diffusion; EUV; Polymer bound PAG; Resists

Indexed keywords

ACID DIFFUSION; ACID GENERATION; CHEMICAL AMPLIFICATION; CHEMICALLY AMPLIFIED RESIST; CONTINUOUS IMPROVEMENTS; EUV; HIGH RESOLUTION RESISTS; NOISE PROBLEMS; PATTERN COLLAPSE; POLYMER-BOUND PAG; RESIST MATERIALS; RESIST SYSTEMS; RESISTS;

NOISE POLLUTION; PHOTORESISTS; POLYMERS; QUANTUM YIELD;

MATERIALS;

EID: 79955887078     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.882958     Document Type: Conference Paper

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