Study on acid diffusion length effect with PAG-blended system and anion-bounded polymer system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7639, Issue , 2010, Pages

  Tarutani, Shinji ^a   Tsubaki, Hideaki ^a   Takahashi, Hidenori ^a   Itou, Takayuki ^a   Matsunaga, Kentaro ^b   Shiraishi, Gousuke ^b   Itani, Toshiro ^b  

^a FUJIFILM CORPORATION   (Japan)

^b Research Dept 2   (Japan)

Author keywords

acid diffusion length; EUV lithography; resolution; sensitivity; SFET

Indexed keywords

ACID DIFFUSION LENGTH; BLENDED SYSTEMS; EUV LITHOGRAPHY; LOADING AMOUNT; POLYMER SYSTEMS;

ACIDS; DIFFUSION; POLYMERS;

DISSOLUTION;

EID: 77953524463     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.846033     Document Type: Conference Paper

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