Sensitivity of EUV resists to out-of-band radiation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7273, Issue , 2009, Pages

  Roberts, Jeanette M ^a   Bristol, Robert L ^a   Younkin, Todd R ^a   Fedynyshyn, Theodore H ^b   Astolfi, David K ^b   Cabral, Alberto ^b  

^a INTEL CORPORATION   (United States)

^b MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

EUVL; Extreme ultraviolet lithography; Out of band; Resist; Sensitivity; Spectral purity

Indexed keywords

EUVL; OUT-OF-BAND; RESIST; SENSITIVITY; SPECTRAL PURITY;

COST REDUCTION; ELECTRON BEAM LITHOGRAPHY; LASER PULSES; LIGHT; LIGHT SOURCES; SPECIFICATIONS; TECHNOLOGICAL FORECASTING; ULTRAVIOLET DEVICES; WAVELENGTH;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 65849383998     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814342     Document Type: Conference Paper

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