Chemically amplified resists: Past, present, and future

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue I, 1999, Pages 2-12

  Ito, Hiroshi ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSTS; EXCIMER LASERS; POLYMETHYL METHACRYLATES; POLYSTYRENES;

CHEMICAL AMPLIFICATION; PHOTOCHEMICAL ACID GENERATORS;

PHOTORESISTS;

EID: 0032670585     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350143     Document Type: Conference Paper

References (8)