Directed assembly of block copolymers on lithographically defined surfaces

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7637, Issue , 2010, Pages

  Craig, Gordon S W ^a   Nealey, Paul F ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

193NM IMMERSION LITHOGRAPHY; BLOCK COPOLYMER FILMS; CHEMICAL PATTERN; DIRECTED ASSEMBLY; FABRIC ARCHITECTURES; FEATURE SHAPE; INTERNATIONAL TECHNOLOGY ROADMAP FOR SEMICONDUCTORS; LITHOGRAPHIC SYSTEMS; PATTERN TRANSFERS; SIMULTANEOUS ACHIEVEMENT; SOLVENT ANNEALING;

COPOLYMERIZATION;

BLOCK COPOLYMERS;

EID: 77953311301     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.852263     Document Type: Conference Paper

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