Novel silicon containing polymers as photoresist materials for extreme UV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 II, Issue , 2003, Pages 1204-1211

  Kwark, Young Je ^a   Bravo Vasquez, J Pablo ^a   Ober, Christopher K ^a   Cao, Heidi B ^b   Deng, Hai ^b   Meagley, Robert ^b  

^a School of Operations Research and Industrial Engineering   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

Chemical amplification; EUV lithography; Polysilane; Ring opening metathesis polymerization; Silicon containing polymer

Indexed keywords

COMPLEXATION; COPOLYMERIZATION; INTERFEROMETRY; MOLECULAR WEIGHT; ORGANIC POLYMERS; RING OPENING POLYMERIZATION; SILICON COMPOUNDS; SYNTHESIS (CHEMICAL); ULTRAVIOLET RADIATION;

ACID SENSITIVE MONOMERS; CHEMICALLY AMPLIFIED POLYSILANE-COPOLYMERS; NORBORNENES; PHOTORESIST MATERIALS; POLYMER PLATFORMS; RING OPENING METATHESIS POLYMERIZATION;

PHOTORESISTS;

EID: 0141722617     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485184     Document Type: Conference Paper

References (14)

1. R. F. Cunico, J. Org. Chem. 36, 929, 1971.
2. G. W. Kabalka and D. E. Bierer, Organometallics, 3, 655, 1989.
3. R. S. Saunders, R. E. Cohen, and R. R. Schrock, Macromolecules, 24, 5599, 1991.
4. J. R. Stille, B. D. Santarsiero, and R. H. Grubbs, J. Org. Chem. 55, 843, 1990.
5. G. N. Taylor, L. E. Stillwagon, F. M. Houlihan, T. M. Wolf, D. Y. Sogah, and W. R. Hertler, Chem. Mater. 3, 1031, 1991.
6. West, R., J. Organomet. Chem., 300, 327, 1986.
7. Matsuura, Y., et al., Polymer, 43, 1549, 2002.
8. www-cxro.lbl.gov/optical_constants/filter2
9. (a) W. E. Crowe, J. P. Mitchell, V. C. Gibson, and R. R. Schrock, Macromolecules 23, 3534, 1990.
10. (b) A. D. Benedicto, J. P. Claverie, and R.H. Grubbs, Macromolecules 28, 500, 1995.
11. (c) H. Katayama, F. Yonezawa, M. Nagao, and F. Ozawa, Macromolecules 35, 1133, 2002.
12. F. W. Michelotti and J. H. Carter, Polymer Preprint 6, 224, 1965.
13. Stelzer, F., et al., 230th ACS National Meeting, Boston, 2002.
14. Matsuura, Y., Tamai, T., Matsukawa, K., Inoue, H., Hamamoto, T., Toyota, H., Sato, K. J. Photopolym. Sci. Technol., 14, 175, 2001.