Estimating the out-of-band radiation flare levels for extreme ultraviolet lithography

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 8, Issue 4, 2009, Pages

  George, Simi A ^a   Naulleau, Patrick P ^a   Rekawa, Senajith ^a   Gullikson, Eric ^a   Kemp, Charles Drew ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

Extreme ultraviolet; Extreme ultraviolet lithography; Flare; Microfield exposure tool; Out of band; Resist sensitivity; Resists

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; EXPOSURE METERS; LIGHT; LIGHT SOURCES; MULTILAYERS; OPTICS; PULSED LASER APPLICATIONS; REFLECTION; ULTRAVIOLET DEVICES;

EXTREME ULTRAVIOLET; FLARE; MICROFIELD EXPOSURE TOOL; OUT OF BAND; RESIST SENSITIVITY; RESISTS;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 70349935008     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3238514     Document Type: Article

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