Improved lithographic performance for EUV resists based on polymers having a photoacid generator (PAG) in the backbone

Journal of Photopolymer Science and Technology

Volumn 18, Issue 6, 2005, Pages 737-741

  Thiyagarajan, Muthiah ^a,b   Dean, Kim ^c   Gonsalves, Kenneth E ^a,b  

^a Cameron Applied Research Center   (United States)

^b UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE   (United States)

^c SEMATECH   (United States)

Author keywords

Line Edge Roughness; Poly(HOST co EAMA co PAG); Polymer bound PAG

Indexed keywords

EID: 33745629472     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.18.737     Document Type: Article

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