Nanolithography using extreme ultraviolet lithography interferometry: 19 nm lines and spaces

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3052-3057

  Solak, H H ^a   He, D ^a   Li, W ^a   Cerrina, F ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040114843     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590953     Document Type: Article

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