SCOPUS 정보 검색 플랫폼

Volumn 23, Issue 2, 2010, Pages 211-215

Sub 30nm node contact hole patterning using immersion single exposure with negative tone development

Author keywords

Contact hole patterning; Negative tone development; Positive tone development; Resolution; Single exposure

Indexed keywords

EID: 77957089560 PISSN: 09149244 EISSN: 13496336 Source Type: Journal
DOI: 10.2494/photopolymer.23.211 Document Type: Article

Times cited : (10)

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- TMTrade mark of The Dow Chemical Company ("Dow") or an affiliated of Dow
- TMTrade mark of The Dow Chemical Company ("Dow") or an affiliated of Dow.

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